High-k Gate Dielectrics for CMOS Technology
He Gang и Sun Zhaoqi
Жанр:техническая литература
Язык книги:Английский
Тип:PDF книга
Издательство:John Wiley & Sons Limited
Дата публикации:08.12.2022
Просмотры:47
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О книге: A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies. Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.